Ion beam etching deposition equipment - メーカー・企業と製品の一覧

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Ion Beam Etching and Deposition Device 'QuaZar(TM)'

Achieving high throughput! Large-area ion source and advanced motion control.

We would like to introduce our ion beam etching and deposition system, 'QuaZar(TM)'. With a large-area ion source and advanced motion control, it achieves high throughput. In particular, the Marathon(TM) grid allows for excellent uniformity over a long period compared to conventional methods. 【Specifications】 ■ Ion beam system ■ Process temperature: -40℃ to +60℃ ■ Tilt angle: +90 degrees to -80 degrees ■ Load lock or CtoC ■ Wafer sizes: 100mm, 150mm, 200mm * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.

企業：プラズマ・サーモ・ジャパン
価格：Other

Etching Equipment

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Ion Beam Etching and Deposition Equipment 'QuaZar'

It is possible to reduce total ownership costs! Achieving top-class uniformity and throughput.

"QuaZar" is an etching and deposition device that achieves process results in challenging etching processes and thin film formation applications through a large-area ion source and advanced motion control. The Marathon grids technology of this product is a key element and can be installed in your existing systems. Many customers around the world have successfully improved the performance of their existing equipment with grid technology, extending its lifespan by more than double. 【Features】 ■ Uniformity <2% 3σ (200mm wafer), with scanning motion achieving <0.6% 3σ ■ Ion Source, Marathon Grid, and Dual PBN have doubled the MTBM compared to conventional systems and can be equipped on existing devices from other manufacturers ■ Clustering with our PVD, CVD, etc. is possible ■ 150mm, 200mm *For more details, please feel free to contact us.

企業：プラズマ・サーモ・ジャパン
価格：Other

Etching Equipment

ブックマークに追加いたしました

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ブックマークを削除いたしました

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これ以上ブックマークできません

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